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In this study, we experimentally demonstrated that the compound targets the nuclear export of vRNP.
magnetron sputtering on 420 tool steel substrates with Cu+Ni P compound targets.
The coatings grown from the compound targets showed, in contrast to those synthesized from the mosaic targets, tensile stresses.
The deposition rate achieved with the compound targets was ~ 44% higher than that obtained for the mosaic targets.
Nanocomposite Ti B N coatings have been prepared by reactive arc evaporation from Ti B compound targets.
Magnetron sputtering from compound targets is widely used for the deposition of compound films since it is easy to scale up and it exhibits a high reproducibility.
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Ti B C N films were deposited by unbalanced DC magnetron sputtering with Ti/B4C compound target.
Therefore, compound 5j is a promising hit compound targeting this severe form of cancer.
Films with a maximum possible amount of nitrogen were prepared by sputtering a FePt compound target with pure nitrogen.
Ti Al N thin films were synthesized utilizing a high power impulse magnetron sputtering (HIPIMS) from a Ti2AlN compound target.
We have studied the sputtering of TiB2 coatings by HiPIMS from a compound target in an industrial system.
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