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The film composition was characterized using XPS.
The chemical composition was characterized by auger electron spectroscopy (AES).
The phase composition was characterized with Fourier transform infrared spectroscopy.
The composition was characterized by energy dispersive X-ray spectroscopy (EDX, S-570, and Japan).
The crystallographic phase composition was characterized by Raman spectroscopy (see Figure 2).
Their surface chemical composition was characterized by Fourier transform infrared spectroscopy (FTIR).
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And the relevant microstructure and composition were characterized.
Also, the elemental composition is characterized by energy-dispersive X-ray (EDX) analysis.
In addition, the elemental composition is characterized by energy-dispersive X-ray (EDX) analysis.
The surface morphology and phase composition were characterized by SEM, EDS, XRD and XPS analyses.
The coating morphology and composition were characterized by scanning electron microscopy (SEM).
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