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The shape of compensating structure at different steps during etching is designated by dotted lines.
In several kinds of microstructures, for instance, the mesa structure surrounded by bent V-grooves and the crossed V-grooves for chip isolation as presented in Figure 36, the space available around the convex corner is less than that is required for the incorporation of compensating structure.
In this work, we investigate an alternative approach to cw deep-UV generation by employing the low-loss BBO in a monolithic walk-off compensating structure [J.-J. Zondy, Ch. Bonnin, D. Lupinski, J. Opt. Soc. Am. B 20 (2003 16755] to simultaneously enhance the effective nonlinear coefficient while minimizing the UV beam ellipticity under tight focusing.
This type of compensating structure can provide the sharp edge convex corner only if the compensation geometry at the end is consumed by only the lateral etching of vertical {100} planes.
The progressive change in the shape of the compensating structure during the etching process is illustrated by dotted lines.
The length of the slit must be slightly longer than twice the required etch depth to ensure that the compensating structure is completely underetched.
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In square and triangular compensating structures, the triangular shape is more convenient due to its simple design.
It can be noticed in Figure 24(b) that the compensating structures at the top part of the corners have been consumed.
The dimensions of the compensating structures depend on the etch depth up to which the convex corners have to be created.
Therefore, the stress compensated structure of the PZT cantilevers was investigated for the horizontal mirror.
These transitions obviously occur also in upper GaAs layers of our pseudomorphic structure, compensating mostly the negative effect of the near-substrate layers on the PV signal.
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