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ZnO nanowires on F-doped SnO2 (FTO) or In-doped SnO2 (ITO) substrates are typically prepared by a two-step approach involving the coating of a substrate with ZnO seed nanoparticles which serve as nucleation sites for the formation of nanowires under hydrothermal treatment [21, 22].
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The method involved subjecting a finite length strip of coating on a substrate to an axial compressive load parallel to the interface, thus loading the interface in shear.
An experimental investigation to evaluate the radiative properties of a selectively transparent thin coating on a substrate of a different material has been performed in order to evaluate its thermal behavior for applications where a low temperature at the surface exposed to the sun is desired.
The study shows that the coating of a metallic substrate by a catalyst is not straightforward and requires specific studies dealing with both chemistry (chemical affinity between substrate and catalytic layers) and catalytic engineering (catalytic performance in taylor-made reactors).
This technique allows coating of a semiconductor substrate with an electrocatalyst and a stabilizing layer by using a homogeneous, heterobimetallic precursor in one-step.
After deposition of the main TiC coating at a substrate temperature of 300 °C, analysis of the elemental composition of the coating substrate interface was performed using the Auger electron spectroscopy method.
The application of plasma-based techniques is quite diverse, and examples of applications may include cleaning/sterilization or coating or deposition of a substrate.
A complex interdependence exists between the individual properties of a coating and a substrate on the one hand, and those of the 'composite' coated system on the other.
Testification was made on a TiSiCN coating of steel substrate with a 50 nm thickness Ti interlayer to improve adhesion, and a reasonable value of the interfacial toughness of 205 J/m2 was gained.
These polymers, in both solvent-based and hot-melt formulations, are applied as a coating onto a substrate of paper, cellophane, plastic film, fabric, or metal foil.
The combination of ion implantation and physical vapor deposition is a versatile system which allows successive and simultaneous coating, doping or cleaning of a substrate surface in a complex, finely adjustable system.
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