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Ti-aC coatings have been deposited by unbalanced magnetron sputter deposition, in an industrial-scale four-target coating deposition system.
The corrosion parameters for polished coatings are slightly worse than unpolished, which is related to the method of coating deposition.
Coating deposition is one such method.
Parameters for coating deposition were listed in Table 1.
The substrate temperature was below 200 °C during the coating deposition.
Plasma nitriding process and TiN coating deposition were done in separate systems.
10×-SBF was chosen to enhance the kinetics of coating deposition.
Figure 1 shows the schematic diagram of coating deposition set-up.
During Rh coating deposition, 0.05 0.7 g of metal was obtained depending on electrolysis time.
EPR was used to investigate the local structure changes of HAP after the coating deposition.
The dedicated software was elaborated to control the sequential coating deposition based on the electrostatic interaction.
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