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The cleaning condition and the interaction between factors did not present statistically significant differences on the bond strength.
In the following electrical studies of graphene devices, we set the laser cleaning condition to be 30 mW (180 s)−1 for monolayer GFETs to realize fast, effective, and noninvasive removal of polymer residues.
Irrespective of the cleaning condition, the hydrosoluble gel group presented higher bond strength values and this might be explained because the hydrosoluble gel can be removed from the root canal walls during the etch-and-rinse steps of the adhesive technique for post cementation.
This represents the highest possible F-measure in each cleaning condition after testing multiple thresholds.
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Scanning electron microscope (SEM) images of all the samples after the seed-layer activation and the NW growth were carefully examined to perform a qualitative analysis of the NW morphologies based on the different activation (i.e., cleaning) conditions.
Moreover, it has to be noted that the assessment of cleaning conditions of fan coil units was not the aim of this study, then the number of samples analyzed was not wide enough to make any statement about this subject.
A polyoptimal model of cleaning conditions was developed.
The quantitative effects of different chemical cleaning conditions (temperature, TMP and stirring speed) on model parameters were determined.
In contrast, in NFC, additional components (like hemicellulose, lignin, and other substances) are contained, depending on isolation and cleaning conditions during the production process.
Harsh cleaning conditions may cause introduction of defects to the graphene layers or its delamination due to the absence of interfacial bonds to the substrate.
A total of 24 comparable testing areas were then defined to evaluate different cleaning conditions in terms of agar concentration, application time and presence of additives.
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