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XRD, Raman, XPS, FT-IR, and H2-TPR were selected for the physical structural and chemical surface analysis.
Largely homogeneous plasma deposition along and across the 50 k carbon fiber tow is demonstrated by chemical surface analysis and high resolution microscopy.
The chemical surface analysis performed on the samples suggests an influence of the passive layer composition on the passivation current density.
Investigation of the anodic oxide on n-InP has been made with an approach coupling photocurrent transient and capacitance measurements in the dark, associated to chemical surface analysis by photoelectron spectroscopy (XPS).
The chemical surface analysis images with different magnifications of ZnO nanostructures prepared using thermal oxidation at 15 20 kV.
Secondly, no chemical surface analysis was performed.
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The surface coverage of the silica with mercaptopropyl-groups was analyzed by two different ways (elemental analysis and chemical surface reaction with 2,2′-dipyridyl disulfide followed by HPLC-UV analysis of stoichiometrically liberated pyridyl-2-thione).
Electrochemical impedance spectroscopy, XPS surface analysis, ICP/MS chemical analysis method and a set of standard biological tests were employed in the study.
The morphological effects of the DBD treatment have been analysed by optical microscopy, SEM, AFM, and chromatic coding distance measurement while XPS was used for analysis of the chemical surface composition.
ToF-SIMS is a powerful surface analysis technique that allows chemical characterization of the first atomic layers of any vacuum stable solid surface.
This XPS system is used for thin film surface analysis of elemental composition and chemical bonding states.
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