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The annealing at T = 600 K turns off oxygen atom from SiO2 surface in the interface between carbon and SiO2 clusters; thereafter, the excited charged defect has to relax before becoming an Е'γ center.
Since the charged defect density in the annealed film should be proportional to the volume fraction of the SiN x matrix, we suggest that the increase in the charge defect density would increase the probability of trap-assisted tunneling and thus compensate the enhanced Vbi effect with increasing Rc value, leading to similar J0, as well as Voc for all heterojunction solar cells.
Both effects can be beneficial for (charged) defect stabilization.
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Moreover, the charged defects or impurities can also screen the field due to coulombic interaction.
The point defect phase diagram illustrates that fully charged defects dominate in most regimes.
In the same experimental set-up, near-field photoluminescence showed a highly localised light emission from the negatively charged defects.
The polarization field can be screened by applied voltage, free carriers or charged defects, and strain relaxation.
Kirchartz et al. discussed the influence of charged defects on the information derived from fitting space-charge-limited current models to the experimental data [30].
The carbon and nitrogen atoms are mainly bonded in sp, sp2 and sp3 configurations that may contain N charged defects.
Regarding the charged defects, the model considers the dependencies of charge reactions, electric bias, pairing and break-up reactions according to the local Fermi level.
It has been reported that formation of charged defects would occur in SiN x films after high-temperature annealing owing to the removal of hydrogen atoms [24, 25].
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