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A change of the surface roughness after 60 s in O 2 plasma did not occur.
Figure 5 demonstrates a significant change of the surface morphology due to the plasma treatment.
The MI variation was explained by the change of the surface magnetic anisotropy.
Schematic map was also introduced to describe the change of the surface morphology.
The change of the surface composition after the end of the electrolysis is also examined.
The relaxation of this position is visible in the slope change of the surface stress change pattern.
These AFM images show the change of the surface morphology of In x Ga1 − xAs QDs with increasing growth time.
Furthermore the change of the surface roughness of PPY under electrochemical conditions is studied by in situ ECAFM.
The chemical dissolution resulted in an extreme change of the surface morphology, exposing various crystallographic facets at the surface.
The deposition process was visually accompanied by gradual color change of the surface of PS from black to red which is typical for copper.
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Significant changes of the surface morphology after annealing are evident.
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