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With the trapdoor zeolite, we also demonstrated the ability to physically encapsulate and store appreciable amounts of H2 and CH4 without sustained external pressure, and the ability to regulate its release by thermally controlled decapsulation.
Here we report a Ni anode modified by BaZr0.9Yb0.1O3−δ particles that demonstrates stable performance in CH4 (without coking) and decreased sulfur poisoning.
The temperature surface reaction (TPSR) of CH4 without O2 confirmed the differences between the two systems, i.e. with and without CeO2.
The polyimide in a proton form (NTDA BAPHFDS(H)) displayed higher selectivity of H2 over CH4 without loss of H2 permeability.
RF excited gas discharges of hexamethyldisiloxane (HMDSO) with and without oxygen and methane (CH4) without further carrier gas were examined to identify reaction parameters determining deposition rate and film properties of SiOx and a-C H films, respectively.
Here, a novel method to synthesize uniform and large area graphene films directly on various high-temperature resistant insulating substrates such as SiO2/Si, Al2O3 and quartz glass by low pressure chemical vapor deposition (LP-CVD) using a mild oxidant (CO2) and a carbon source (CH4), without the aid of any metallic species or catalysts, is reported.
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