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In this study, a range of amorphous, hard and oxidation-resistant Si B C N O coatings are deposited on various technically important metallic and ceramic substrates by using electron cyclotron resonance (ECR) plasma-assisted CVD at moderate temperatures.
The Chen group fabricated a randomly positioned SiGe/Si multi-quantum-well (MQW) nanowall by using electron cyclotron resonance plasma etching on an as-grown SiGe/Si MQW, and the measured electroluminescence intensity of the SiGe/Si MQW nanowalls increased to about 1.5 times for the enhancement of emission light extraction [13].
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TiN thin films were fabricated on Si (100) substrates using Electron Cyclotron Resonance (ECR) microwave plasma technique.
Cubic boron nitride containing thin films were deposited on (100) Si and steel substrates using electron cyclotron resonance plasma enhanced chemical vapor deposition.
a-C H films were deposited on polymethyl metha-C Hate (PMMA) using electron cyclotron resonance (ECR) microwave plasma (MP) decomposition ofilms diluted in Ar gas.
An SUS316L stainless steel separator was coated with amorphous carbon by using an electron cyclotron resonance (ECR) plasma sputtering technique, and used in a polymer electrolyte fuel cell (PEFC).
A carbon film consisting nanocrystallites with mixed sp2 and sp3 bonds formed by using the electron cyclotron resonance (ECR) sputtering method was studied with respect to the changes in characteristics caused by electrochemical pretreatment (ECP).
Hydrogenated amorphous carbon nitride films that include presumably oxygen atoms were prepared by using the electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD) of mixed gases of He, BrCN, and H2O.
The contrast in the positive and negative poling region can be significantly mitigated by either carefully controlling the deposition temperature or using the PZT films exposed to an ion beam using an electron cyclotron resonance (ECR) ion source with an argon and oxygen gas mixture [62].
The power spectrum of OFA-SPEC is divided into 5 bands using the electron cyclotron frequency calculated from the DC magnetic field obtained by the magnetic field experiment (MGF) instruments (Matsuoka et al. 2017).
We fabricated electrochemically stable fluorinated nano-carbon film that had an sp2 and sp3 hybrid nanocrystalline structure formed using the electron cyclotron resonance (ECR) sputtering method.
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