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Next, the sample was loaded in the electron-beam evaporator, and 5 nm of SiO2 was evaporated, followed by 90 nm of Cr by using a shadow mask.
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The channel loss between the UE and the eNB is modelled by using a shadowing loss with log-normal distribution and by considering fast fading with Jakes model.
The performance of the two fabricated ionization chambers at a low dose rate was tested by using a conventional shadow technique with a NIST certified 0.906 mCi 226Ra standard source in a calibration room at KAERI.
Finally, 80 nm of gold was deposited by thermal evaporation using a shadow mask to pattern the electrodes.
Electrodes were formed by thermal evaporation using a shadow mask on the active layer.
Finally, an IrO x metal electrode with a nominal thickness of approximately 100 nm was deposited by rf sputtering using a shadow mask with a circular area of 3.14 × 10−4 cm2.
The nanoparticles were transferred onto the desired area on a substrate by thermophoresis and were patterned using a shadow mask to realize patterned growth of CNTs.
Dot-shaped Au top electrodes with an area of ~3.14 × 10−4 cm2 were deposited on the surface of the samples using a shadow mask by vacuum evaporation.
Pt top electrodes of area 1.55 × 10−4 cm2 were deposited on the surface of HfO2 films using a shadow mask by sputtering method for electrical measurements.
The problem of creating an acoustic shadow from these sources by using a controlled array of discrete cancellers is then considered.
To measure the electrical properties of the films, Au top electrodes were patterned and deposited by sputtering using a metal shadow mask.
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