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Adding energy both thermally and by using a plasma is discussed; atomic-layer deposition is briefly considered.
The structures are synthesized by using a plasma enhanced chemical vapor deposition method.
The silicon nitride films were deposited by using a plasma enhanced chemical vapor deposition system and process parameter effects were systematically characterized by 26−1 fractional factorial experiment.
The nitrogen was introduced during deposition by using a plasma emission monitoring (PEM) control system at different degrees of target poisoning rates.
A Cu Ni alloyed layer on titanium was obtained by using a plasma surface alloying technique to improve antibacterial activity and wear resistance.
Diamond-like carbon (DLC) films were deposited by using a plasma enhanced chemical vapor deposition (PECVD) onto Si(1 0 0) wafer.
Similar(51)
We focused on the effects of de-bonding photoresists on the surface by using a plasma-assisted supercritical carbon dioxide removal process with various control parameters.
Finally, a 2 μm-thick silicon dioxide upper cladding was deposited on the SOI sample by using a plasma-enhanced chemical vapor deposition system from Applied Materials (except in the beam-steering experiment, in which a 1 μm-thick layer was used to improve the efficiency of the nanoheaters).
This work investigated the decomposition of dilute N2O from gas streams with various oxygen contents by using a plasma-catalytic process over metal oxide catalysts supported on γ-Al2O3.
The porous silicon nanofibers are coated with a graphene by using a plasma-enhanced chemical vapor deposition for use as an anode material of lithium ion batteries.
Figure 7c shows an array of FETs with random network SWCNTs that were synthesized on a catalyst (0.01 M of ferrocene) array by using a plasma-enhanced chemical vapor deposition (PECVD) method at low temperature (450°C) [138].
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