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The concentration of Pb can be controlled by the source temperature of PbTe.
In this equation, the parameter related to Se (T PbSe) is limited by the source temperature of ZnSe, kept constant at 843 K.
The deposition rate (10 to 50 nm/min) is tightly controlled by a closed-loop temperature control algorithm where the output RF power is modulated by the source temperature.
Similar(57)
The source temperature attained by the nickel heating chamber is 570°C, and the corresponding deposition temperature experienced by the growth substrate ranges from 160°C to 330°C.
The source temperature was 325°C.
The source temperature was RT.
The source temperature was 110°C.
The source temperature was 120°C, and desolvation temperature was 325°C.
The source temperature was set at 400°C.
The source temperature was set to 150°.
The source temperature was set to 120 °C.
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