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By the dot layer, the InGaAs matrix is split into two parts.
Optical and structural properties of the InAs QDs strongly depend on the embedded matrix which is splitted into two parts by the dot layer, i.e., the strain reduction layer (SRL) on top and the strained buffer layer (SBL) at the bottom of the dot layer.
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The Schottky barrier is made by contacting the quantum dot layer with a metal electrode.
We have simulated the internal photoluminescence emissions of the quantum dot layer by Gaussian function based on the published experimental results.
The thickness of the Ga0.85In0.15As layer grown before the InAs dot layer formation turned out to be one of the key parameters to control the dot morphology.
The best optical properties were achieved by an asymmetric quantum well design with a 1 nm thick GaInAs layer below and 5 nm above the InAs dot layer.
The thickness of the CdS quantum dot layer was tuned by SILAR cycles, which was found to be closely related to light absorption and carrier transformation.
By embedding a quantum dot layer in these microcavities, an enhancement in the collection efficiency was found, and the emission of the underlying wetting layer was suppressed by using non-linear spectroscopy.
Thus the first quantum dot layer consisted of 75% CdS and 25% ZnS and it was followed by a CdSe layer and by an additional ZnS layer on the top.
By repeating dot layers separated by spacer layers with a few nanometers in thickness, a more homogeneous size distribution could be achieved, simultaneously with novel physical properties induced by coupling [7, 8].
The effective dynamic conductivity of Ge quantum dot layer was determined by measuring the transmission coefficient spectra of heterostructures grown on Si 001) substrates.
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