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A non-aqueous approach was developed to synthesize iron phosphate cathode materials by the atomic layer deposition (ALD) technique.
The 2D WO3 films with the thickness of ∼6.0, 1.2 and 0.7 nm were fabricated by the atomic layer deposition (ALD) technique.
In order to measure the effective lifetime of as-prepared SiNWs and α-Si H-covered SiNWs, 25-nm-thick Al2O3 layers were deposited on the backside of the wafers by the atomic layer deposition (ALD) method.
The Ni thin film was then deposited by the atomic layer deposition (ALD) process using bis(dimethylamino-2-methyl-2-butoxo nickel dimethylamino-2-methyl-2-butoxo nickelgas as the reactant.
Next, a 20-nm-thick AlO x film, as resistive switching layer, was deposited by the atomic layer deposition (ALD) at 220°C by using the precursors of trimethylaluminium (TMA) and H2O.
Ma et al. [16] prepared ultrathin (~1.5 nm) Al2O3 films by the atomic layer deposition technique on Ag nanorods that can maintain robust morphologies to a temperature of 400 °C.
Similar(51)
By controlling the atomic layer depositing ratio of ZrO2 and Y2O3, we were able to achieve the cubic phase YSZ-NTs with high aspect-ratio up to ~ 110.
Here, we demonstrate that swelling-induced mesoporous block copolymers can be templates for producing three-dimensional TiO2 networks by combining the atomic layer deposition technique.
The dense array of nanotubes is produced by coating the surface of a porous Anodized Aluminum Oxide template by Pt using the Atomic Layer Deposition technique.
Herein, we synthesize the multi-functional aligned CNT/titanium dioxide (TiO2) hybrid fibers involving CNT-based continuous fibers coated by TiO2 through the atomic layer deposition (ALD).
By increasing the atomic-layer-deposition thickness, the deformation mechanism of nanocolloidal crystals transitions from granular to bonded granular and, finally, to particle-reinforced composite behavior.
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