Sentence examples for by sequential deposition of from inspiring English sources
LbL assembly is achieved by sequential deposition of poly-l-lysine (PLL) and poly ethylene glycol -block-poly l-aspartic acid) (PEglycol -block-poly l-asparticticles (LbL-LNPs).
A polyelectrolyte delivery system for vitamin C, achieved by sequential deposition of positive chitosan (CH) and negative sodium alginate (AL) onto the surface of anionic nanoliposomes (NLs), was investigated.
Here we discuss the synthesis of multi-component La0.7Ca0.3MnO3 YBa2Cu3O7−δ oxide thin films and their heterostructures, which were grown in situ by sequential deposition of LCMO and YBCO thin films on 〈0 0 1〉 LaAlO3 substrate using a pulsed laser deposition (PLD) system.
In the latter case, the microstructure can be designed by choice of the deposition technique chosen, understanding the growth processes taking place on a film surface, either by sequential deposition of layers or by taking advantage of newly discovered self-organization processes including segregation effects of the elements.
In this communication we discuss the surface chemistry and some other characteristics of hydrophilic films, containing carboxylic acid functional groups, formed by plasma oxidation of COP and also films containing cross-linked, polymerized acryclic acid produced by sequential deposition of tetraorthosilicate and acrylic acid by plasma enhanced chemical vapor deposition (PECVD).
Layer-by-layer self-assembled thin films were fabricated by sequential deposition of oppositely charged polymer and TiO2 nanoparticles at room temperature.
The immobilization of β-glucosidase on the polymer surfaces was achieved by sequential depositions of a piece of the polymer films in PS-DAS and the enzyme solutions.
A single-wall carbon nanotube film was deposited by the sequential deposition of positively charged single-wall carbon nanotube with poly diallyldimethylammonium and negatively charged single-wall nanotube with poly sodium 4-styrenesulfonate.
Then, a high-κ Ta2O5 film with a thickness (tTa2O5) of approximately equal to 7 nm was then deposited by an e-beam evaporator, followed by the sequential deposition of a thin (approximately equal to 3 nm) interfacial layer of titanium (Ti) and approximately equal to 200-nm-thick W layer as a TE by radio-frequency (rf) sputtering.
Then, a high-κ Ta2O5 film with a thickness ( t Ta 2 O 5 ) of approximately equal to 7 nm was deposited by an e-beam evaporator, followed by the sequential deposition of a thin (approximately equal to 3 nm) interfacial layer of titanium (Ti) and approximately equal to 200-nm-thick W layer as a TE by radio-frequency (rf) sputtering.
During the preparation of perovskite layer by sequential deposition method, a proper addition of CH3NH3I to PbI2 solution not only enhances the absorption but also reduces the recombination rate, resulting in the improvement of efficiency in PSCs [28].
