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This was followed by reactive sputtering of a second SiO2 layer (Si target in an O2 atmosphere).
Carbon nitride thin films have been deposited on silicon substrates by reactive sputtering of a pure graphite target.
An increase of the substrate temperature to 498 K favours the crystallinity of the samples deposited by reactive sputtering of Zn.
This work focuses on the stability of elemental composition of films deposited by reactive sputtering of CuSn alloy targets in H2S.
Carbon nitride films have been deposited on Si (100) substrates by reactive sputtering of carbon target with the helicon wave-excited high-density nitrogen plasmas at ∼0.1 Pa.
Multi-element AlxCoCrCuFeNi (the molar ratio of x = 0.5, 1, and 2) oxide thin films were deposited by reactive sputtering of homogeneous alloy targets.
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In previous studies, we have evaluated the electrical performance of Schottky contacts produced using different kinds of refractory metal nitrides such as titanium nitride (TiN), MoN, TaN, MoSiN, WTiN, ZrN, and HfN on GaN by reactive sputtering in an ambient of Ar and N2 mixture sputtering gas [6 8].
The top electrode (TE) of IrOx approximately 200 nm thick) was deposited by reactive sputtering using a pure Ir target and O2 as the reactive gas.
Herein, we obtain titanium nitride (TiN) by reactive sputtering using different N2/Ar sputtering gas ratios.
Thin gold films can be strengthened by the incorporation, during reactive sputtering, of nanosized dispersions of monoclinic zirconia.
Thin films of Nb2O5 and SiO2 have been deposited by magnetron sputtering of an oxide target (SiO2) and reactive sputtering of a niobium target in an oxygen containing atmosphere, respectively.
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