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Among the methods of obtaining the Si nanostructures we cite electrochemical etching [4, 9], fabrication of silicon dots by plasma sputtering technique [10], and multilayer approach [8, 11, 12].
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An SUS316L stainless steel separator was coated with amorphous carbon by using an electron cyclotron resonance (ECR) plasma sputtering technique, and used in a polymer electrolyte fuel cell (PEFC).
Mo films were deposited over soda-lime glass substrates using DC-plasma magnetron sputtering technique.
Quasi-periodic one-dimensional Cantor photonic crystals are elaborated by depositing alternating silicon and silica Si/SiO2 layers by radiofrequency magnetron sputtering technique with cold plasma.
TiO2 films prepared by reactive sputtering technique were treated by Ar, O2 and N2 radio frequency plasma, respectively.
In this work, DLC coatings were deposited on untreated and plasma nitrided (at 400 °C, 500 °C and 600 °C for 1 h and 4 h) AISI 4140 steel substrates by magnetron sputtering technique.
Pd anodic catalyst is prepared by magnetron sputtering technique onto a microfiber carbon paper support.
High-entropy CoCrFeNiAl0.3 alloy thin films were prepared by magnetron sputtering technique.
d The surface of film was covered with a Fe70Co30 layer by the sputtering technique.
These SRSO structures may be successfully deposited by magnetron sputtering technique.
ZrC + C specimens in the form of a thin layer (4.9 μm) sputtered on isolating substrates by magnetron sputtering technique were used.
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