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During their oxidation, an outermost TiO2 layer was formed by outward diffusion of Ti ions, and the outer Al2O3 layer was formed by outward diffusion of Al ions.
The appearance of the monoclinic ZrO2 phase (Fig. 1) can be explained by outward diffusion of Cu which stimulates outward diffusion of Y from such grains [32].
Scanning electron micrographs revealed an outer oxide scale with a columnar structure grown by outward diffusion of Ti and Al cations.
At hypoeutectic temperatures, compressive stress is developed in the films due to the larger thermal expansion of Al film than Si substrate, and this stress facilitates diffusional flow of Al atoms followed by outward diffusion of Si atoms.
The outer oxide layer formed primarily by outward diffusion of Cr, Al, and Fe ions, while the inner mixed layer formed primarily by inward diffusion of O−2 ions.
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The rate of this process is controlled by the outward diffusion of Al cations.
This transformation of Ge distribution can be caused by the outward diffusion of Ge during annealing (Fig. 4b).
It is deduced therefore that the growth of the multilayered and mixed oxide scales was dominated by both outward diffusion of metal and inward diffusion of oxygen.
The oxidation kinetics of the Cr-based coatings is controlled by the outward diffusion of Cr ions through a top Cr2O3 layer.
The oxidation products of the Cr Si N film were Cr2O3 and amorphous SiO2, which were gradually formed by the outward diffusion of Cr, Si, and N as well as the inward diffusion of oxygen.
Previous studies by Ichimura et al. [27, 28] on the oxidation of AlN and CrN coatings indicated that oxidation in the AlN/CrN system is controlled by the outward diffusion of Cr due to its lower activation energy for diffusion in Cr2O3 (255 kJ/mol [27]) as compared to diffusion of Al in Al2O3 (477 kJ/mol [28]).
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