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Fabrication was done by optical lithography using a patterned chrome mask of SU-8 ridge waveguide and micro-ring resonator structures, which was replicated onto a plasma enhanced chemical vapour deposited (PECVD) silicon-dioxide layer on a silicon wafer.
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Then, bottom electrodes (BE) were defined by conventional optical lithography using double-layer photoresists and electron-beam evaporation of the 5 nm Ti film and 30 nm Pt film, followed by the lift-off process.
The tried-and-true way to put fine patterns on surfaces is optical lithography, used for decades to carve circuits onto computer chips.
That is because most microchips are made by optical lithography, a process that uses light to carve the circuits that are etched on chips.
The electrical resistance of the grafted samples was tested by using the electrical metallic pads patterned on the outside surface by optical lithography and lift-off technique and compared with the response of the pristine PSi.
Stripes were patterned onto graphitized SiC substrates by optical lithography.
Samples were patterned by optical lithography and ion etching.
Aluminum (Al) electrodes for lateral conduction were defined by optical lithography and Al etching.
The array pattern was fabricated on the ZnO thin film by optical lithography method.
(b, c) Positioned microtubes obtained from <100> -oriented trenches defined by optical lithography.
Via-holes with varying diameters from 2.5 to 50 μm were patterned by optical lithography.
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