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In contrast, the heights of protuberances formed by electrical processing with vibration were higher than those of areas mechanically processed with vibration.
The heights of the protuberances formed by electrical processing with vibration at a high voltage were higher than those by mechanical processing with vibration.Current distribution images of these electrically processed areas are shown in Figure 5b.
The height of the protuberance formed by electrical processing with 10 nm amplitude vibration at 4.5 V was nearly 0.6 nm. Figure 5 Dependence of surface properties on applied load during electrical processing with 10 nm vibration.
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Decreasing rate in the current of processed surface that was anodized by electrical processing saturated at a certain applied voltage.
With sequential processing, the local oxide layer formed by electrical processing can be removed by mechanical processing using the same tip without vibration.
For sequential processing, the resistivity increases by electrical processing because of anodic oxidation.
The processed surface and cross-sectional profiles of Si subjected to electrical processing with 10 nm amplitude vibration are shown in Figure 5a.
Although the electrical resistance is decreased by the mechanical processing without vibration, additional electrical processing on the mechanically processed area further increases the electrical resistance of the surface.
The protuberance composed of the oxidation layer processed by the electrical processing can be removed by an appropriate mechanical processing without vibration.
The electric resistance of the mechanically processed area can then be increased because of oxidization by additional electrical processing.
This means that the oxide layer formed by the electrical processing remained even after mechanical processing at 2,000 nN load.
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