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The decrease can be explained by consecutive etching of the plasma-treated surface layer in Au nanoparticles solution.
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However, an increase in the extent of racemization was also observed as bleaching time increased (Fig. 2b), possibly due to sequential etching of the biomineral by the NaOCl.
This was followed by acid etching of the silver from the shells.
Nonclose-packed MCC template can be prepared by plasma etching of the as-prepared MCC template.
Herein, we report on the fabrication of ∼1 × 1 cm Ti3C2 films by selective etching of Al, from sputter-deposited epitaxial Ti3AlC2 films, in aqueous HF or NH4HF2.
PSi films were fabricated by electrochemical etching of silicon (p-type, 0.01 Ω⋅cm) in a 15% ethanolic hydrofluoric acid based electrolyte.
Porous silicon (pSi) films were prepared by anodic electrochemical etching of polished Si wafers.
Fractography carried out on the impact fracture surfaces and images obtained by scanning electron microscopy after etching indicated the existence of a fringe structure formed by consecutive ductile brittle and brittle ductile transitions, which is related to the appearance of discontinuities in the load deflection curves.
The discoidal nonporous silicon particles were fabricated from polycrystalline silicon (PolySi) film by photolithography with a reactive ion etching of silicon.
Hassam's print is an extraordinarily detailed etching of two monumental trees, produced by the artist late in life.
Following deep etching of more than 50 μm by TMRIE, PhC structures were then revealed for device etching.
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