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Ion bombardment, achieved by applying a negative voltage bias or unbalanced sputtering conditions, improves the friction and wear performance.
The increase of ion bombardment energy was obtained by applying a negative potential Ub = − 150 V to the substrate.
This energy can be supplied by applying a negative voltage (V) to the normal metal, with respect to the voltage of the superconductor.
Cells attached to gold-coated membrane substrates via the oligopeptide layer were readily and noninvasively detached by applying a negative electrical potential to cleave the gold thiolate bond.
The cells attached to the gold surface via the oligopeptide were readily and noninvasively detached by applying a negative electrical potential and cleaving the gold thiolate bond.
The results showed that the mechanical properties, adhesive behaviors, and tribological performance of AIP Cr2O3 films were greatly altered by applying a negative bias voltage.
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After a gigaohm seal was obtained by negative pressure, the cell membrane was ruptured by applying a gentle negative pressure to establish the whole-cell configuration.
The number of nuclei was then reduced by applying a less negative potential (>−700 mV vs. Ag/AgCl) to deposit a single nucleus inside each nanopore.
Single-wall carbon nanotubes (SWCNTs) were produced by an electrochemical route by applying a small negative potential to a solution of acetic acid over a Au surface supporting Ni nanocatalysts.
The metallic filament is gradually dissolved by applying a higher negative voltage.
Interestingly, the photo-induced current and the bias back-gate voltage are linearly related, indicating that higher photoresponsivity can be readily obtained by applying a larger negative bias back-gate voltage.
More suggestions(16)
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