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The films were prepared by sol gel dip-coating on AISI/SAE 304 stainless steel followed by a thermal annealing.
Titanium oxide films were synthesized by a thermal annealing in oxygen at 300 600 °C.
Sample #1 was then deposited with a 0.45-nm Au at 150°C followed by a thermal annealing at 550°C for 20 min to generate the nanotrenches.
By a thermal annealing process the SiOx-coating was oxidised to UV-transparent SiO2, resulting in a UV-grade surface relief element.
NiO and NiCo2O4 nanosheets (NSs) were controlly prepared by one method called a bottom-up strategy employing surfactant molecular self-assembly, and followed by a thermal annealing process.
The ferroelectricity can be easily induced by a thermal annealing after spin coating above the Curie temperature (but lower than 140 °C), results in no interfacial layer formation during the crystallization process.
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To enhance the surface plasmon resonance effect in the coatings, the growth of Au nanoparticles was stimulated by applying a thermal annealing treatment at different temperatures up to 500 °C.
Self-aligned metallic source/drain (S/D) was formed by depositing 10 nm nickel followed by a thermal anneal (RTA) at ~450 °C for 30 s.
Monodoping Li as acceptor, p-type ZnMgO thin films have been realized via dc reactive magnetron sputtering followed by a thermal anneal process.
Herein, 3D hierarchical porous CNFs with different loading amounts of metallic Co are prepared in situ by the electrospinning method combined with a thermal annealing process.
A large area ohmic contact on the back-side was formed by the sputter of a 100-nm Ni film, followed by a rapid thermal annealing process at 950°C in N2 for 90 s.
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