Your English writing platform
Discover LudwigExact(1)
Both the QDs layer and the buffer layer were grown at 530 °C.
Similar(59)
The AlN buffer layer was grown by MBE (SVTA 35 V-2).
After that, a 30-nm-thick Si buffer layer was grown at 700 °C.
First, a 500-nm GaAs buffer layer was grown on a GaAs 001) substrate.
A 300-nm undoped GaAs buffer layer was grown at a substrate temperature Ts of 580°C.
First, a 400 nm GaAs buffer layer was grown at 600°C.
Before growth of MnAs, a 100-nm GaAs buffer layer was grown to smoothen the surface.
A 0.5-μm undoped GaAs buffer layer is grown at 580°C, followed by a 30-nm Al0.33Ga0.67As barrier layer.
Next, a GaAs buffer layer was grown on the surface by using MBE until atomically smooth surface was obtained.
Moreover, APDs may be reduced to a maximum extend if a buffer layer is grown on Ge substrate.
Then, a GaAs buffer layer was grown for all samples under a temperature of 550°C for 15 min.
Write better and faster with AI suggestions while staying true to your unique style.
Since I tried Ludwig back in 2017, I have been constantly using it in both editing and translation. Ever since, I suggest it to my translators at ProSciEditing.

Justyna Jupowicz-Kozak
CEO of Professional Science Editing for Scientists @ prosciediting.com