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An additional tunneling factor which characterises the tunneling effect of buffer layer is introduced.
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In order to accommodate the large lattice mismatch between the InAs0.87Sb0.13 epilayer and the InAs substrate, the InAs0.92Sb0.08 buffer layer was introduced.
For the purpose of improving adhesion, the BNX implanted buffer layer was introduced between the HSS and c-BN film deposited by the RF-magnetron sputtering.
In order to improve the adhesion of the c-BN film, the boron implanted buffer layer was introduced to improve the interface state between the film and substrate.
To overcome the drawbacks of Yb-Gd-Y-based material with inferior thermal durability due to poor mechanical properties and low coefficient of thermal expansion, a buffer layer was introduced in the Yb-Gd-Y-based TBC systems.
A In2S3 buffer layer was introduced between TiO2 and CuInS2 layer also by SILAR.
Thus, when the AlN buffer layer was introduced, the growth direction of ZnO films was kept along [002].
This is quite similar to what happened when InGaN buffer layer was introduced between ZnO and Si substrate [23].
The 60-nm-thick AlN buffer layer was introduced to improve the crystalline quality and change the growth direction of ZnO films from [100] to [002].
In this work, AlN buffer layer was introduced and the valence band offset (VBO) of ZnO/Si heterojunction was modified from 3.06 to 3.78 eV while the VBO between AlN and Si substrate was 2.95 eV.
The irregular cross profile of sample A revealed a polycrystalline nature of the ZnO film grown without any buffer layer on Si. Figure 2b shows that the AlN buffer layer was introduced between the ZnO film and Si substrate, and the thickness of AlN buffer layer was measured to be 60 nm.
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