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This film showed a breakdown field strength of 4 MV cm−1.
Breakdown field strength of the as-deposited Al2O3 and SiO2 films ranges from 4 to 9 MV/cm.
Breakdown field strength values between 1 and 9 MV/cm were achieved for the as-deposited Al2O3 and SiO2 films.
In the case of SiO2 films, considerably higher resistivity and breakdown field strength were obtained for process conditions with high plasma density and hence increased energetic substrate bombardment.
Electrical properties of the films such as breakdown field strength, resistivity and dielectric constant have been measured in relation to pulse mode, substrate bias, deposition rate and size of contact pads.
In this study, the organosilicate glass (OSG) incorporated with nitrogen and fluorine (N-F OSG) was iN-F OSGated by examining the bonding configuration, refraction index, modulus, permittivity and breakdowasfinvestigatedh.
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Figure 4a, b illustrates the polarization-electric field [P-E] hysteresis loops and the breakdown field strengths of BNTZ ceramics, respectively.
A nonlinear coefficient of ≈ 17.7 and breakdown electric field strength of 1.25 × 104 V/m were observed.
The SiO2 thin films ultimately reached irreversible breakdown at a field strength of 2.7 V nm−1, where Si O bonds were destroyed due to impact ionization and accelerated electrons.
High current flow in this polymer film at elevated field strength caused a breakdown of the electrode, preventing access to an elevated electro-optic coefficient.
One of properties of a disperse matter consisting of a liquid containing gaseous bubbles is the low electric field strength of electric breakdown of this system compared to a pure liquid.
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