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At 3.0 keV, a great deal of signal is observed from below the epoxy layer for both 50- and 30-nm-blank sections.
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The epoxy layer was visible on most part of the concrete substrate and debonded GFRP.
For most samples, a glass counter substrate was then added and the epoxy layer was cured by exposure to a UV lamp for 1 3 h.
The ultrathin epoxy layer also prevents any damage to the parylene film during the sputtering process of the bottom ITO electrode.
Wedge structures containing these four layers were stripped with the epoxy backing layer, revealing smooth Ag surfaces.
Since the failure was still in epoxy layer after 1 year of exposure, the significant improvement of pull-out strength can be because of the improved epoxy properties.
The arrays were covered by an epoxy layer.
The hybrid electrodes and interconnects were passivated with a 500 nm-thick epoxy layer (SU8, Microchem, Inc), except the square-shaped areas which were used for exposing the graphene channels.
An epoxy layer was used to encapsulate the EIS structure and the copper line.
An insulating epoxy layer was then used to cover the silver paste and prevent the silver metal to interact with the solution inside the electrochemical cell.
Bonding strength is evaluated in the presence and absence of the epoxy monolith layer by a tensile lap shear test.
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