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One popular top-down method, namely, the lithography technique, has been used to pattern films into nanoarrays [7, 8].
Several techniques have been used to pattern the non-linear response: re-alignment through a chrome mask of previously electrically poled samples, Lloyd-mirror interferometric configuration to imprint any desired susceptibility periodicity in the sample and all optical poling using mutually coherent beams from a frequency-doubled picosecond Nd Yag laser.
Microfabrication techniques have been used to pattern the surface of the device.
A different type of block copolymer has been used to pattern biomolecules but has not yet been used with cells.
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Photolithography method is used to pattern the thermal oxide layer.
A contact mask was used to pattern the PIII treatment.
Wet etching was used to pattern the silicon substrate.
Optical lithography in combination with CHF3 + O2 plasma etching is used to pattern the nitride layer.
Therefore, another lithography step was used to pattern the devices for lift-off.
Fig. 2 a Photograph of the custom-built tool being used to pattern a 4-in.
After identification of appropriate flakes, electron-beam lithography is used to pattern source/drain contact structures into polymethyl methacrylate (PMMA).
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