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ZnO thin films have been successfully deposited using pulsed laser deposition technique at different substrate temperatures that vary in the range of 20 400 °C.
Ni 25at.% Mo alloys have been successfully deposited using the laser engineered net-shaping (LENS™) process.
In this research, cobalt ferrite (CoFe2O4) coatings have been successfully deposited using a suspension plasma spraying technique.
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0.65Pb Mg1/3Nb2/3 O3 0.35PbTiO3 thin films (PMN-PT) on LaNiO3 (LNO) metallic oxide electrode were successfully deposited using pulsed laser deposition technique.
A 5 μm thin film of ZnO is successfully deposited using RF sputtering technique on plasma-enhanced chemical deposition (PECVD) SiO2 layer of 1 μm on top of Si wafer under various operating conditions.
Those results showed that amine containing films on the crystal surfaces were successfully deposited using atmospheric pressure plasma torch.
We have recently shown that thick oxide coatings on Ti-alloys can be successfully deposited using a micro-arc discharge oxidation (MDO) technique.
By using the relationship between hardness and stress, 1-μm-thick ta-C films were successfully deposited using −2000 V with a moderate hardness of about 36 GPa and a low stress of less than 1 GPa.
The TEM images in Fig. 11 shown the nanotubular structure of Pt-Ru/TNT/C and Pt/TNT/C, on which the catalysts were successfully deposited using the impregnation method.
Transparent and electrically conducting (TCO) thin films of ZnO, SnO2, In2O3 Sn (ITO), ZnO Al (AZO), ZnO Ga, ZnO Sb, ZnO Mg and several types of zinc-stannate oxides (ZnSnO3, Zn2SnO4), which could be used in solar cells, optoelectronic devices, and as gas sensors, have been successfully deposited by FVAD using pure or alloyed zinc cathodes.
Diamond-like carbon (DLC) films have been successfully deposited on Ti 50.8 at.% Ni alloys using plasma based ion implantation (PBII) technique.
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