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Quasicrystalline Al-Cu-Fe coatings have been fabricated using electron-beam physical vapour deposition (EBPVD) at substrate temperatures in the 570 890 K range.
The proposed FIR filter was fabricated using electron beam lithography (EBL).
The SiC mold was fabricated using electron beam drawing and subsequent reactive ion etching with CHF3 and O2 gases.
MDs and MRs with diameter (D) either 2 or 1.5 μm were fabricated using electron beam lithography (EBL) and reactive ion etching (Figure 1b).
A graphene/silicon (Si) multilayer sandwich structures are fabricated using electron beam (EB) deposition without air exposure.
A magnetic actuator consisting of a silicon oxide microcantilever and a silicon oxide plate deposited on ferromagnetic multilayer thin films is fabricated using electron beam lithography and electron beam evaporation, and placed in various magnetic fields to observe its flexure.
As these assembled constructs were expected to closely mimic the topography of the native ECM protein (collagen) in vivo, such nanopattern substrates were fabricated using electron beam lithography and atomic layer deposition as previously reported [ 22].
The magnetic elements were fabricated using electron-beam lithography and a lift-off procedure for pattern transfer.
The overall length of the photonic crystal structure is typically about 39 μm and the structure has been fabricated using a combination of direct-write electron-beam lithography (EBL) and dry-etch processing.
An electron impact ion source has been fabricated using MEMS technology.
The masks necessary for optical lithography were fabricated using standard Electron Beam Lithography (Crestec CABL-9000C Electron Beam Lithography system) methods.
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