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Deflection of the beam was measured using three Linear Vertical Displacement Transducers (LVDTs).
The corresponding deflection of the beam was measured using the rectangular jig clamped to the specimen at mid-depth directly over the supports.
The intensity of the excitation beam was measured using a photodiode, while the intensity of the emitted fluorescence was detected using a gallium arsenide phosphide photomultiplier tube (Hamamatsu).
The deflection of a fixed wavelength (670 nm) probe laser beam was measured using a position sensing detector and lock-in detector to measure the absorption at that particular wavelength.
The optical fiber was then carefully cleaved and the facet was examined using SEM The lateral beam profile of the output beam was measured using a long working distance (WD) objective (Mitutoyo x100 infinity-corrected, WD = 6 mm) to confirm a high quality TEM00 Gaussian beam profile.
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An experimental set-up was designed in which a simply supported beam is excited by an electrodynamic shaker and the response of the beam is measured using an He Ne laser system.
The deflections and rotation of the beam were measured using wire potentiometers installed at the mid-span of the beam.
The deformation behavior and tensile strength of focused ion beam (FIB) fabricated GO micro-beams was measured using in situ atomic force microscopy (AFM).
In this section the overlap between the Ion and Neutral beams are measured using two NEC Beam Profile Monitors (model 80).
Crack evolution and full-field deformation in the beams were measured using the electronic speckle pattern interferometry technique.
The beam equivalent pressure (BEP) was measured using an ion gauge and growth rate calibrations were performed using reflection high-energy electron diffraction (RHEED).
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