Sentence examples for beam lithography can be from inspiring English sources

For example, electron beam lithography can be combined with either lift-off or an etch step to produce nanoscale structures.

Electron beam (e-beam) lithography can be used to fabricate desired high-resolution nanostructures that are not easily prepared using other fabrication methods [46, 47].

E-beam lithography can be combined with nanoimprint lithography, along with some other nanofabrication techniques, to produce features that are sub-10 nm in size [ 53].

Lithography can be performed with beams of neutral atoms in metastable excited states to pattern self-assembled monolayers (SAMs) of alkanethiolates on gold.

The technology is much cheaper and simpler than electron beam lithography and can be used for manufacturing SPR sensor structures [18, 19].

Only the processes of nanopores ordering for PAA on thin Al films by pre-texturing by special stamps or by ion beam etching through an electron beam lithography fabricated mask can be considered as those that secured proved results [2 9].

Advanced techniques as electron beam lithography or focused ion beam milling can be used in this respect; however, they are both expensive and time consuming when large areas have to be patterned.

Though it is generally prepared with expensive exposure tools like electron-beam lithography, the mould can be reused a very large number of times [31].

Importantly, TSA lithography does not have to be necessarily limited to DLW lithography but can be extended to other conventional lithography techniques improving their resolution and cost effectiveness.

X-ray lithography (XRL) can be a potential candidate for next generation lithography.

As the etched Si pattern depends largely on the NIL mould which is patterned by electron beam lithography (EBL), the technique can be used to form patterns not possible with self-assembly methods, nanosphere, and interference lithography for replication on a wafer scale.