Sentence examples for beam lithography based on from inspiring English sources

Pedone et al. [28] developed a small window using electron beam lithography based on the former, which avoided the mask manufacturing and lithography error.

X- and Y-directional rectangular structures with a short period of 1 μm were designed and fabricated by the light lithography based on two beams interference for improvement of the resolutions of the surface encoder for X- and Y-directional position measurement.

For nanoimprint lithography based on the replication of nanostructures inscribed in a stamp using the same electron-beam lithography, the fabrication of the stamps is a slow and costly process.

We report the design of surface plasmon polaritons maskless lithography based on metal dielectric multilayers.

Efficient nanochemosensors designed by electron beam lithography and based on localized surface plasmon resonance excited on noble metal nanocylinders are presented.

We have designed and fabricated a low-energy electron-beam lithography system based on a single column module (SCM) microcolumn.

However, since current fabrication technologies, such as photolithography and electron-beam (EB) lithography, are based on two-dimensional (2D) patterning techniques, the realization of true three-dimensional (3D) optical metamaterials is still a challenge [7].

In a laser interference lithography (LIL) process, it is of importance to determine and control beam incidence conditions based on the analysis of laser interference patterns for system calibration as any slight change of incident angles or intensities of beams will introduce significant variations of periods and contrasts of interference patterns.

Lithography is based on the fact that water and grease do not mix.

We presented also high-resolution lithography measurements based on a standard STED setup.

Various GaN gratings are defined by electron beam lithography and realized on GaN-on-silicon substrate by fast atom beam etching.