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Additional 5 min ion beam etching continued after the photoresist was etched away, as detailed in Ref. [7].
ion beam etching.
This phenomenon could be attributed to the ion beam etching.
The determined structure was fabricated on a conventional AFM cantilever by using focused ion beam etching.
They also require several processing steps, involving photoresist deposition/removal and chemical or ion beam etching.
These were subjected to well defined exterior heat and moisture loads and investigated by means of focused ion beam etching.
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With electron-beam etching, past systems have required millions of circuits to be etched, in effect, a line at a time.
A chemically assisted micro-beam etching system for 3D microanalysis was designed.
The fabrication of the ridge waveguide using chemically-assisted ion-beam etching has been optimised.
We find that the overlayer can be easily removed by ion-beam etching.
By confining the lateral width of planar waveguide, a single-mode channel waveguide at 1540 nm is fabricated by focused-ion-beam etching.
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