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We provide the foundations for an enabling technology that can be used to pattern cells in unique ways, allowing us to do novel cell biology experiments at the microscale.
The machines make building up the layers of the material needed easier, but they cannot be used to pattern the actual transistors of a backplane.
A single anode tool could be used to pattern up to five substrates, substantially minimising the amount of lithographic processing required.
This technique can be used to pattern endothelial cell-lined lumens in different microchannel geometries, enabling increased flexibility for a variety of studies.
An interference pattern is created in the focal plane of the focusing lens, which can be used to pattern the surface of materials.
This technique does not have any specific substrate restrictions, and can be used to pattern conducting polymers on flexible, rigid, conducting, or insulating substrates using the present photolithography facilities available to industry and academia.
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An EBL system (Raith EBPG-5000Plus) was used to pattern the PtSe2 channels and contacts.
A contact mask was used to pattern the PIII treatment.
Wet etching was used to pattern the silicon substrate.
A laser source was used to pattern the MNs, and a pyrolysis process was applied for the conversion of SMNs to glassy CMNs.
Example photographs are shown in Fig. 5d,e, for which a star-shaped mask (shown in Fig. 5f) was used to pattern the gel.
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