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Porous crystalline TiO2 films can be prepared at low temperatures (80 °C) by surfactant-assisted electrodeposition from TiCl3 solution.
Unlike traditional semiconductor nanomaterials, low-dimensional halide perovskites can be prepared at low cost and by solution-processable techniques.
ALD Al2O3 thin films enable perfect passivation similar to high-quality thermally grown silicon oxide and can be prepared at low temperatures (<300°C).
The graft polymer nanocomposite hydrogel system may be prepared at low polymer and crosslinker concentrations and have higher gel strength and required longer gelation time than the conventional gel systems.
Herein, we present a very simple and straightforward wet chemical process to synthesize composites comprising anatase TiO2 NPs-coated CNTs, which can be prepared at low temperature of 100 °C.
A mixture of C60(C2F5 2,4 and C60(C2F5)1,3,5H was prepared by the reaction of C60Cl6 with LiC2F5 at ca. −95 °C in toluene solution (note that LiC2F5 is thermally unstable and has to be prepared at low temperature and used immediately).
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Au/TiO2 cotton nanocomposite textile was prepared at low temperature (∼100 °C) by sol gel and photodeposition process designed for practical applications.
Using Hot-Wire Chemical Vapor Deposilicon(HWcarbidechninue, silicon carbide in microcrystalline form (μc-SiC H) has been prepared at low substrate temperature.
The WS2-based counter electrodes for dye-sensitized solar cells (DSSCs) are prepared at low temperature.
Silicon nitride (SiN) films had been prepared at low substrate temperature (100 °C) using the ion-assisted deposition (IAD) process.
The whole range of plasma polymers and their future prospects are summarized, starting from those resembling conventional polymers that are prepared at low power, and ending with the new materials prepared at high power.
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