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The proposed H-HPCF structure can be fabricated using a sol gel technique method and is expected to be useful for wideband imaging and communicating applications too.
Glass nanopipettes with an outer diameter of less than 1 μm can be fabricated using a puller --same apparatus used for fabricating micropipettes but with different fabrication parameters.
Nanostructures enabling the PE effect can be fabricated using a multitude of methods [21].
As Eq. (1) suggests, the perovskite can be fabricated using a wet chemistry process.
To reduce device variability, the Si nanoparticle layer can be fabricated using a bottoms-up approach.
Previously, we found that PbS NPs (<4 nm) can be fabricated using a sonication-assisted SILAR method when cycle number (n) is 5 [9].
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A biphasic current stimulator chip was fabricated using a 0.8-µm high-voltage complimentary metal-oxide semiconductor fabrication process at Austria Micro-Systems Corporation as described previously [34].
The IMX046 is fabricated using a 90 nm CMOS process.
The THH-VCSOA is fabricated using a four-contact configuration.
These electrodes were fabricated using a standard lift-off process.
Smooth surface, crystalline 3D metallic nanostructures are fabricated using a laser shock imprinting technique.
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