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The resulting SPS models can be directly fabricated using additive manufacturing (AM) techniques.
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A copper sulfide (CuS) nanowire (NW) array with a hierarchical nanoarchitecture is directly fabricated on copper foil using a simple and cost-effective liquid-solid reaction.
Porous Ni-Cu alloy films composed of nanosheets are directly fabricated on Cu substrate using a facile potentiostatic electrodeposition approach from a 1 2 choline chloride-ethylene glycol eutectic solvent (ethaline) containing nickel chloride and copper chloride.
We successfully demonstrate that the resist-free AR nanostructures are directly fabricated on PC film using T-NIL and the shape of AR nanostructures is elaborately optimized with different oxygen RIE conditions.
Resist-free antireflective (AR) nanostructured films are directly fabricated on polycarbonate (PC) film using thermal-nanoimprint lithography (T-NIL) and the moth-eye shape of AR nanostructure is elaborately optimized with different oxygen reactive ion etching conditions.
LiMO2 (M=Ni and Co) films were directly fabricated in a concentrated LiOH solution at fixed temperatures, between 100 and 200 °C, using Soft Solution Processing.
DSSCs were fabricated using these directly grown nanowires, and the performance was compared to those fabricated using transferred ZnO nanowires.
SiNWs can also be fabricated using chemical vapor deposition.
DSSCs have been fabricated using the directly synthesized ZnO nanowires with different lengths.
DSSCs were fabricated using both directly synthesized and transferred ZnO nanowires in order to compare their performance.
The nanofiber scaffolds of nHA/PLGA, sHA/PLGA, and PLGA were successfully fabricated using electrospinning technique.
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