The approach is a general one and can be applied to pattern classification, similarity determination, and knowledge discovery in time varying data patterns occurring in many practical sciences and engineering problems.
Second, the novel technique can be applied to pattern most materials or layers in IC fabrication such as silicon, germanium and transistor gate, or dielectric materials to fabricate specifically required nanostructures by RIE processes.
Recent works on this topic mostly involve fabricating magnetic nanoparticle superstructures with alignment and shape anisotropy through evaporative or convective deposition process, during which geometric constraints or external stimuli could be applied to pattern or direct the assembled superstructures [18 21].
This chapter addresses some of the basic architectures, techniques, and algorithms that have been applied to pattern recognition.
Second, soft UV-NIL was applied to pattern the GaAs surface.
Unconventional soft-lithographic techniques have also successfully been applied to pattern spin-crossover nanoparticles and to perform reliable nanopatterns of crystals and molecular deposits [11].
The near-field enhanced laser irradiation with 248 and 355 nm UV lasers was applied to pattern a silicon surface in a massively parallel fashion[8].
Electron-beam-lithography process was applied to pattern the sSOI layer, as schematically shown in Figure 8.
It is believed that it can be applied to image patterns, digital image processing, data processing, signal sparse decomposition and information technology, etc.
