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Atomic layer deposition (ALD) is a kind of novel thin film deposition technique based on unique sequential self-limited surface chemisorptions reactions [20, 21].
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Generally, lucrative opportunities also can surface based on unique circumstances.
A: Calculation based on unique sequences.
*OD=odds ratio based on unique family sets.
Our implementation operates in up- and down-swing phases which are based on Sequential Forward Selection (SFS) and Sequential Backward Selection (SBS).
Moreover, six-lumped model was derived based on the sequential strategy [42].
In [19], a new decomposition, PARATREEa, based on the sequential unfolding SVD (SUSVD) was proposed.
The method in [1, 2] is based on the sequential construction of Lyapunov functions.
The analysis is based on a sequential procedure in which models of increasing complexity were tested.
Reduced models are formulated based on the sequential identification of controlling resistances in the complete model.
Based on the sequential Monte Carlo simulation method, these technologies are integrated into the reliability evaluation process.
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