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Atomic layer deposition (ALD) is a technology based on sequential self-saturated surface treatment and reactions, which lead to the controlled cycle-by-cycle period growth of very thin films.
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So far, the only effective approach growing high-quality thin films is the atomic layer deposition (ALD) technique based on sequential self-terminating gas-solid reactions [7].
Atomic layer deposition (ALD) is a novel thin film deposition technique based on sequential self-limited and complementary surface chemisorption reactions using precursor vapor.
It is a thin film growth method based on sequential, self-limiting surface reactions that can deposit conformal thin films with excellent conformal step coverage and is ideal for the deposition on complex non-planar surface topography [22, 23].
The model based on sequential joint features of Aac, Sse and Acc outperformed any other pure sequential features-based model (Table 1).
PF is a sequential Monte Carlo methodology based on sequential importance sampling (SIS).
It uses Matlab software based on sequential running time.
Most of the solutions are based on sequential methods that make inference according to current information.
The GB conversion method is based on sequential Bayesian tracking, using a GB formulation.
Most traditional computational methods to classify SAPs are based on sequential or structural features.
Asterisks denote significance based on sequential Bonferroni correction critical values.
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