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This technique is based on self-limiting surface chemical reactions with excellent deposition effect, which can make the thicknesses of individual nanolayers well-controlled for the composite stack.
ALD is a thin film growth technique that is based on self-limiting and surface reactions, resulting in films deposited in a layer-by-layer fashion.
In contrast to these techniques, atom layer deposition (ALD) is based on self-limiting film growth via alternate saturative surface reaction.
Comparing to other techniques, ALD is an excellent deposition technique based on self-limiting surface chemical reactions that can be used to prepare highly uniform and smooth films while their thickness can be precisely controlled.
It is well known that plasma-enhanced atomic layer deposition (PEALD) is a low-temperature growth method based on self-limiting growth mechanism, which can deposit highly uniform and conformal angstrom-scale thin films.
Ultrathin films of well-ordered CdS on Ag(1 1 1) can be attained by electrochemical atomic layer epitaxy (ECALE) technique, which is based on self-limiting reactions, such as underpotential deposition.
The assessment of disease information which is based on self reports is limited owing to undiagnosed diseases and false diagnosis, because the patient forgets on it or misunderstands the diagnosis.
Resilience is based on self confidence.
However, there are several limitations of the study; the results are based on self-report which is limited to the accuracy of individual's recall of their behaviour and truthful responses.
Findings were based on self-report, which had limited validity and reliability.
Furthermore, the presence of comorbid conditions was based on self-report, which may limit the validity of these data.
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