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The fabrication is based on deep reactive ion etching of silicon and low temperature full wafer adhesive bonding.
A novel fabrication process to obtain parallel plate metallic capacitors based on deep reactive ion etching (DRIE) bulk micromachining techniques have been developed.
An advanced process for self-assembly of three-dimensional micro-opto-mechanical systems (MOEMS) is demonstrated, based on deep reactive ion etching of bonded silicon-on-insulator material, sacrificial etching, and out-of plane rotation powered by the surface tension of thick photoresist pads.
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