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The custom made PLD system (AOV Ltd) consisted of a vacuum chamber with a base pressure of about 10−6 Pa, equipped with a load-lock chamber.
The growth experiments were carried out in an ultrahigh-vacuum chamber with a base pressure of about 1 × 10−10 Torr.
The field emission measurements were performed in a vacuum chamber with a base pressure of about 6 × 10−6 Torr at room temperature.
All films are deposited by thermal evaporation technique keeping substrate at room temperature and at a base pressure of about 10−6 Torr.
The growth chamber was pumped down to a base pressure of about 2 × 10-4 Pa initially and was then filled with Ar up to 0.8 Pa.
The experiments were performed within an ultrahigh-vacuum system (OMICRON MBE-SPM system) which consists of a growth chamber and an analysis chamber with a base pressure of about 2.0 × 10−10 mbar.
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The base pressure of the chamber was about 10−7 Torr and the process pressure was 14 mTorr (Ar flow rate, 16 sccm).
XPS experiments were carried out on a RBD-upgraded PHI-5000C Esystemstem (PerkinElmer, Waltham, MA, USA) with Mg Kα radiation (hν = 1,253.6 eV), and the base pressure of the analyzer chamber was about 5 × 10−8 Pa.
Pure argon (99.999%) with 30 cm3/min flow rate controlled by a mass flow controller was used as sputtering gas, and the base pressure of the vacuum chamber is about 3 × 10-5 Pa.
The base pressure of STM chamber was 3 × 10−9 mbar.
Both systems had a base pressure of 5 × 10−10 mbar.
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