Roughness measurements, average roughness (Ra), mean peak-to-valley height (Rz), and maximum roughness (Ry), were taken from the sanded samples along and across the sandmarks using a fine stylus tracing technique.
Average roughness (Ra) was measured by a probe-type surface roughness analyzer ET-4000AA, KOSAKA, Chiyoda-ku, Tokyo, Japan).
For example, its analysis functions include to profile tracer and region, line measurement of height, line profile, power spectrum, line histogram, regional measurement of height, average roughness, volume, surface area, histogram, bearing ratio, and grain analysis functions.
Also, the root mean square (RMS) roughness and the average roughness values obtained from AFM measurements are shown in Table 3.
The measurements of the average roughness (Ra) and the mean-square-root roughness (RMS) of the specimen were 23.4 and 29.3 nm, respectively.
Membrane surface was achieved by measuring roughness parameters e.g. the average roughness (Ra) and root mean square roughness (Rrms), values of which were given in Table 1.
When the measurements were conducted on nanoscale images, the results indicated that both average roughness (Ra) and the mean height of membrane surface particles increased after activation (Fig. 2a). Figure 2 Histograms of statistical results.a,b The average roughness and cell height of the resting and the activated groups are approximately equal.
However, conventional surface roughness (profile) measurements indicate no statistically significant change in the roughness, using conventional metrics such as average roughness, Ra.
Measurement results of six Zr-based BMGs samples with a roughness ranging from 0.06 to 0.98 μm demonstrate excellent correlation between the peak power and average roughness with a determination coefficient (R2) of 0.9974.
The surface roughness (arithmetic average roughness) of the parts is 0.0002 mm.
The roughness profiles and average roughness values were determined using 3D profilometry.
