Sentence examples for average diffusion length from inspiring English sources

I− ions need to diffuse through the nanostructures to the Pt cathode surface, and the average diffusion length is approximated to be the half of the film thickness.

An exponential growth with time is expected for the initial stages of the process, when the lengthl of the whisker is smaller than the average diffusion length λ of adatoms.

The preserved characteristics include the reactor volume, an averaged diffusion length scale, and the area of the catalyst pile.

Most importantly, the SiC grains were found to be faceted in nature, and the coarsening rate was found to be independent of the vol.% liquid in the system or the average diffusion path length.

However, these results illustrate that the average hole diffusion length will decrease with an expected negative knock on effect on device efficiency.

The average 1-dimensional carrier diffusion length was measured to be 1.2±0.2 μm in the low injection limit.

Overall, the average diffusion speed of full-length PKCα was 3.3-fold slower (0.44 ± 0.04 μm/s) than that of its C2 domain on PC/PS bilayers (1.45 ± 0.06 μm/s) (Table 2 and Figure 6A).

Nanoislands with a high density and narrow size distribution can be obtained within an intermediate temperature range, and the Ge atom diffusion length is comparable to half of the average distance of the Si nanotips.

As described in Eq. (1), the diffusion length L depends on the average jump distance a, the Gaab desorption energy Qdes, and the activation energy for a surface diffusion jump Qd [13].

As the island density is inversely related to the characteristic diffusion length, i.e. the average distance between two neighboring islands, it is evidenced that the diffusion length (∼17 nm), despite being significantly larger than the typical distance between the domain walls (5 9 nm), does not decrease with increasing domain wall density (see Fig. 2c).

These findings were discussed in terms of the surface diffusion length L compared with half of the average distance of Si nanotips on the substrate.