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The etching process was controlled both by LSPR spectra and SEM images at different etching intervals.
Another experiment was to wet etch the sample in an undiluted gold etchant and measure its LSPR spectra at different etching intervals to control the etching process.
Because the 3D gold nanostructures after wet etching are mainly under the silica nanospheres and cannot be observed by scanning electron microscope (SEM) or atomic force microscope (AFM), the profiles of the nanostructures at different etching intervals are also simulated, and we find that the trend of this wavelength shift is predictable by profile simulation.
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Figure 9 Reflectance curves of etched samples in HF/V 2 O 5 (0.12 M) at different etching times.
Figure 6 Effect of normal loads on the etching rates at different etching temperatures.
Figure 2 shows the schematic representation of nanotip formation at different etching times.
In this work we investigate the morphological, optical, and electronic properties of SiNWs fabricated at different etching times.
The progress of transformation of the tips and photoresist at different etching time is displayed in Table 1.
Fig. 5 High resolution XPS scan of a region containing O1s peak taken at different etching levels Fig. 6 N1s to Zn2p3/2 XPS peak intensities ratio of sample with N2/Ar ratio of 0.60 at different etching levels Fig. 7 O1s to Zn2p3/2 XPS peak intensities ratio of sample with N2/Ar ratio of 0.60 at different etching levels.
Fig. 3 XPS full scan survey of sample grown at N2/Ar gas flow rate ratio of 0.60 before etching Fig. 4 High resolution XPS scan of a region containing N1s peak taken at different etching levels.
Figure S8 (Supporting Information) shows the oxygen 1 s peak at different etching times.
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