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The maximum initial rate increased from 32 μmol/(min·mg) at a substrate concentration of 100 mM to 62 μmol/(min·mg) at a substrate concentration of 200 mM.
Here the films were deposited on glass substrate at a substrate temperature of 350°C [18].
The samples investigated here were grown by PAMBE at a substrate temperature of Tgr.
The as-grown TiO2 film is amorphous deposited at a substrate temperature of 165°C.
The as-grown TiO2 film is anatase deposited at a substrate temperature of 250°C.
A metal Ti target was ablated in oxygen atmosphere at a substrate temperature of 400°C.
In our experiments, under the same laser energy, the growth mode of the CdS nanoneedles is VS at a substrate temperature of 400°C, but it turns into VLS at a substrate temperature of 450°C.
The graphene films, grown at a substrate temperature of 620 °C show good verticality and openness.
magnetron sputtering at a substrate temperature of 500 °C in various argon oxygen nitrogen plasmas.
The deposition was performed at a substrate temperature of 350°C with 2 min deposition time [15, 16, 17].
The growth is initiated with a thermal oxide desorption at a substrate temperature of 580 °C under Sb flux.
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